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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets...
Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets... more
Brand Name:CSTI
Model Number:20221010
Place of Origin:China
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Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine Product Details: Grade: Gr1 Gr2 Gr5 Titanium ,TiAl, TiCr, TiCu,TiSi,Mo,Cr etc. As customers' requests Size: 60/65/70/80/85/90/95/100(D)/200/300/400×20/30/32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering...
Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine Product Details: Grade: Gr1 Gr2 Gr5 Titanium ,TiAl, TiCr, TiCu,TiSi,Mo,Cr etc. As customers' requests Size: 60/65/70/80/85/90/95/100(D)/200/300/400×20/30/32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering... more
Brand Name:LHTi
Model Number:Titanium Target
Place of Origin:Baoji, Shaanxi, China
Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine
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High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. 3. Zirconium has good ...
High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. 3. Zirconium has good ... more
Brand Name:JINXING
Model Number:Zirconium Sputtering Target
Place of Origin:China
Zirconium Zr702 High Purity Metal Sputtering Targets
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...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target...
...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target... more
Brand Name:FGD
Model Number:fgd t-002
Place of Origin:China
W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot
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Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The ...
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... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,
... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass, more
Brand Name:Sanhui
Model Number:Mo1
Place of Origin:Henan, China
3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating
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...Sputtering Targets For The Semiconductor Industry 1. Description Of Molybdenum Sputtering Targets For The Semiconductor Industry: Molybdenum is a versatile refractory metal with outstanding mechanical qualities, a low coefficient of expansion, strong thermal conductivity, and exceptionally high electrical conductivity at high temperatures. There are numerous combinations that can be used as sputtering targets...
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...Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (amorphous) g·cm−3 Melting point:1,713 °C (3,115 °F; 1,986 K) Boiling point:2,950 °C (5,340 °F; 3,220 K) Magnetic susceptibility (χ):−29.6·10−6 cm3/mol Thermal conductivity...
...Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (amorphous) g·cm−3 Melting point:1,713 °C (3,115 °F; 1,986 K) Boiling point:2,950 °C (5,340 °F; 3,220 K) Magnetic susceptibility (χ):−29.6·10−6 cm3/mol Thermal conductivity... more
Brand Name:ZCQ
Model Number:ZCQ
Place of Origin:China
Frosting Silicon Dioxide Sputtering Target 1100Mpa High Corrosion Resistance
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... to corrosion. Molybdenum is widely used in sputtering applications. Shape and Structure: Molybdenum Sputtering Targets are typically disc-shaped or rectangular in form. They have a flat and uniform surface, ensuring consistent sputtering performance. The
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and
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...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target...
...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target... more
Brand Name:Feiteng
Model Number:Titanium tube target
Place of Origin:Baoji, Shaanxi, China
Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...
Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ... more
Brand Name:TORICH
Model Number:304L
Place of Origin:China
DIN2462 Stainless Steel Tubing For Planar Sputtering Target
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Nickel Oxide (NiO) Sputtering Target Purity--- 99.9% Denstiy---7.45g/cm3 Refractive Index---2~2.1 Melting Point ---1410℃ Transparence Wave Band----0.52 um Shape---Discs, Plate,Step (Dia ≤200mm,, Thickness ≥1mm) Rectangle, Sheet, Step (Length ≤300mm, Width...
Nickel Oxide (NiO) Sputtering Target Purity--- 99.9% Denstiy---7.45g/cm3 Refractive Index---2~2.1 Melting Point ---1410℃ Transparence Wave Band----0.52 um Shape---Discs, Plate,Step (Dia ≤200mm,, Thickness ≥1mm) Rectangle, Sheet, Step (Length ≤300mm, Width... more
Minimum Order Quantity:2pcs
Price:US $15 - 20 / Piece
Packaging Details:1.Inner polybag, outer in PP woven bag. 2.According to customer's request.
Metal Nickel target,Nickel Oxide Target
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder...
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... is a soft, ductile transition metal which is resistant to corrosion due to the presence of an oxide layer on its surface. It is one of the most common elements found in the Earth’s Crust. It is often found in the pyrochlore mineral. Uses of Niobium It
... is a soft, ductile transition metal which is resistant to corrosion due to the presence of an oxide layer on its surface. It is one of the most common elements found in the Earth’s Crust. It is often found in the pyrochlore mineral. Uses of Niobium It more
Brand Name:HMD
Model Number:HMD-Nb
Place of Origin:CHN
5100C Niobium Alloy High Purity 99.95% Niobium Sputtering Targets SGS
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... scratch,Anti-Yellowing 2HD Metal Sputter Film 7 YearsWarranty Available(free Sample) A4 Size Customized Logo Acceptable The advantages of our metal sputtering MS series: The most important thing is that there will be no haze, no fogging, no anti-white,
... scratch,Anti-Yellowing 2HD Metal Sputter Film 7 YearsWarranty Available(free Sample) A4 Size Customized Logo Acceptable The advantages of our metal sputtering MS series: The most important thing is that there will be no haze, no fogging, no anti-white, more
Brand Name:NASIDO
Model Number:MS70
Place of Origin:CHINA
NASIDO MS70 2HD Window Tint Self Adhesive Metalized Film Metal Sputter
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...Conductive Thin Film Sputtering Deposition Plant, Silver Sputtering Coating System Copper Magnetron Sputtering Vacuum Coater 1) Film thickness controllability and well repeatability,can be a reliable system of pre-plated thickness of the films and sputtering in a larger surface of uniform film; 2) The adhesion of the film and the substrate is very well. Some of the high energy of sputtered...
...Conductive Thin Film Sputtering Deposition Plant, Silver Sputtering Coating System Copper Magnetron Sputtering Vacuum Coater 1) Film thickness controllability and well repeatability,can be a reliable system of pre-plated thickness of the films and sputtering in a larger surface of uniform film; 2) The adhesion of the film and the substrate is very well. Some of the high energy of sputtered... more
Brand Name:ROYAL
Model Number:RTAS950
Place of Origin:Made in China
Copper Thin Film Coating Machine , Au Conductive Magnetron Sputtering Unit
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ...